
The flexDEP Physical Vapour Deposition (PVD) system
is our most popular platform due to the flexibility of
the sources available.
Built for performance, flexibility and ease of use, it is
the platform of choice for R&D applications and open
access facilities.
Why flexDEP?
- Compact footprint with maximum flexibility
- High-vacuum performance with rapid pump-down
- Manual or fully automated operation
- Intuitive software with22” touchscreen control system
- Engineered for minimal out gassing & stability
- Designed & built in Australia with 2-year warrant
Key Applications
- Quantum & Photonic Devices
- Wearable electronics
- Photovoltaics & perovskite solar cells
- OLEDs, OPVs &OFETs
- Thin-film research & nano fabrication
6”(150mm)Diamter max – 8”(200mm) Optional
+/- 5% uniformity
<5x10-7mbar (3.75 X 10 -7Torr)
- High Temperature ThermalBoat/Crucibles
- Low Temperature Organics
- 2”/3”/4” Magnetron Sputtering (DC,RF,PulsedDC,
HiPIMS)
- E-Beam Evaporation (multi-pocket)
- Ion Source
- High Temperature Thermal=Au,Ag,Cu,Cr,Al…etc
- Organics= Small molecules ALQ3,C60…etc
- Sputtering= Metals, Oxides or Nitrides
- E-Beam=Ti,Pt,W,SiO2…etc
Ar plus up to 5x reactive gases(O2, N2, etc)
- Quartz Crystal monitor for either film monitoring
or thickness control with PID loop
- Optical Emission Spectroscopy
- Heating to 800°C
- Cooling to room temperature or optional -5°C
2 Years
Australia
flexDEP Brochure (pdf)
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