Entry level TVAC system with temperature controlled table
TVAC system with optional shroud for advanced environmental temperature control
TVAC system with large capacity & optional shroud for advanced environmental temperature control
The nanoDEP Physical Vapour Deposition (PVD) system is a compact, cost-effective high-vacuum evaporator designed for metal, oxide, nitride and organic deposition.
The fleDEP Physical Vapour Deposition (PVD) system is our most popular
platform due to the flexibility of the sources.
The boxDEP Physical Vapour Deposition (PVD) system is ultimate R&D
platform due to the flexibility of the substrate sizes, throughput & sources available.
The inertDEP-C Physical Vapour Deposition (PVD) system can be
integrated within a glovebox to create an inert environment for O2 & H20 sensitive materials.
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