inertDEP-C

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The inertDEP-C Physical Vapour Deposition (PVD) system can be 

integrated within a glovebox to create an inert environment for O2 & H20 sensitive materials.

Designed for easy handling and operation within a two-port glovebox, the inertDEP-C is a small 

footprint workhorse for depositing thin films inside an inert environment.

Why inertDEP-C?

- Compact footprint-ideal fo labs with limited space

- High-vacuum performance with rapid pump-down

- Manual or fully automated operation

- Intuitive software with22” touchscreen control system

- Engineered for minimal out gassing & stability

- Designed  & built in Australia with 2-year warrant

KeyApplications

- Quantum & Photonic Devices

- Wearable electronics

- Photovoltaics & perovskite solar cells

- OLEDs, OPVs &OFETs

- Thin-film research & nano fabrication

4”(100mm) Diamter max–Or smaller pieces

+/-5% uniformity

<5x10-7mbar(3.75 X 10-7Torr)

- High Temperature Thermal Boat/Crucibles

- Low Temperature Organics

- 2” or 3”Magnetron Sputtering (DC,RF,PulsedDC,

HiPIMS)

- High Temperature Thermal =Au,Ag,Cu,Cr,Al…etc

- Organics = Small molecules ALQ3,C60…etc

- Sputtering = Metals, Oxides or Nitrides

Quartz Crystal monitor for either film monitoring

or thickness control with PID loop

- Heating to 500°C

- Cooling to room temperature or optional -5°C

- 250l/s Turbomolecular pump with market

leading pumping speeds for light gases

- Optional oil sealed or oil free scroll backing

pump

2 Years

Australia