nanoDEP
Introduction
The nanoDEP Physical Vapour Deposition (PVD) system is a compact, cost-effective high-vacuum evaporator designed for metal, oxide, nitride and organic deposition. Built for performance, ease of use, and reliability — perfect for research labs, universities, and advanced manufacturing.
Why nanoDEP?
- Compact footprint-ideal for labs with limited space
- High-vacuum performance with rapid pump-down
- Manual or fully automated operation
Intuitive software with 15” touchscreen control system
- Engineered for minimal out gassing & stability
- Designed & built in Australia with 2-year warrant
Key Applications
- Quantum computing devices
- Wearable electronics
- Photovoltaics & perovskite solar cells
- OLEDs, OPVs &OFETs
- Thin-film research & nano fabrication
Specifications
Substrate Size & Uniformity
4”(100mm) Diamter max–Or smaller pieces
+/-5% uniformity
Base Pressure
<5x10-7mbar(3.75 X 10-7Torr)
Deposition Source Types
- High Temperature Thermal Boat/Crucibles
- Low Temperature Organics
- 2” or 3”Magnetron Sputtering (DC,RF,PulsedDC,
HiPIMS)
Typical Materials
- High Temperature Thermal =Au,Ag,Cu,Cr,Al…etc
- Organics = Small molecules ALQ3,C60…etc
- Sputtering = Metals, Oxides or Nitrides
Mass Flow Controllers (Sputtering)
Ai plus up to 2x reactive gases (O2, N2)
Deposition Control
Quartz Crystal monitor for either film monitoring
or thickness control with PID loop
Substrate Heating/Cooling
- Heating to 500°C
- Cooling to room temperature or optional -5°C
Vacuum Pumping
- 250l/s Turbomolecular pump with market
leading pumping speeds for light gases
- Optional oil sealed or oil free scroll backing
pump
Warranty
2 Years
Country of Manufacture
Australia